Kouka, Japan

Hiroya Ishida


 

Average Co-Inventor Count = 1.3

ph-index = 2

Forward Citations = 25(Granted Patents)


Location History:

  • Kouka, JP (2008)
  • Koka, JP (2009)
  • Shiga, JP (2016)

Company Filing History:


Years Active: 2008-2025

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5 patents (USPTO):Explore Patents

Title: Hiroya Ishida: Innovator in Boron Nitride Nanomaterials

Introduction

Hiroya Ishida is a prominent inventor based in Kouka, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced nanomaterials. With a total of 5 patents to his name, Ishida's work is recognized for its innovative approach and practical applications.

Latest Patents

One of Ishida's latest patents is focused on a boron nitride nanomaterial and resin composition. This invention comprises a boron nitride nanotube and a boron nitride nanosheet, characterized by a peak top of a Raman spectrum located at 1369 cm or more. Another notable patent involves electroconductive microparticles, anisotropic electroconductive material, and an electroconductive connection structure. This invention aims to provide electroconductive microparticles that are resilient against disconnection due to breakage of connection interfaces, even under impact. The design includes an electroconductive metal layer, a barrier layer, a copper layer, and a solder layer containing tin, all laminated on a core particle made of resin or metal.

Career Highlights

Hiroya Ishida is currently employed at Sekisui Chemical Co., Ltd., where he continues to push the boundaries of material innovation. His work has garnered attention for its potential applications in various industries, including electronics and materials engineering.

Collaborations

Ishida collaborates with talented coworkers such as Takeshi Wakiya and Shinya Uenoyama. Their combined expertise contributes to the advancement of innovative solutions in their field.

Conclusion

Hiroya Ishida stands out as a key figure in the development of boron nitride nanomaterials and electroconductive technologies. His contributions are paving the way for future innovations in materials science.

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