Company Filing History:
Years Active: 2022-2024
Title: Innovations of Hiroto Otake
Introduction
Hiroto Otake is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of etching methods, particularly in semiconductor manufacturing. With a total of four patents to his name, Otake's work has advanced the precision and efficiency of etching processes.
Latest Patents
Otake's latest patents include an innovative etching method designed for silicon oxide films. This method allows for high accuracy and a high selection ratio with respect to silicon nitride films. The process involves etching a film structure where the silicon oxide and silicon nitride films are alternately stacked. By supplying processing gas, including hydrogen fluoride and alcohol vapor, into a processing chamber while maintaining the wafer at a low temperature, the silicon oxide film can be etched laterally from the end portion. Another notable patent is an etching processing method and apparatus that enables the etching of aluminum oxide films with high accuracy and selectivity to silicon oxide and silicon nitride films. This method also involves maintaining the wafer at a low temperature and supplying vapor of hydrogen fluoride from a plate-like member above the wafer.
Career Highlights
Hiroto Otake is currently employed at Hitachi High-Tech Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in enhancing the capabilities of etching processes, which are critical in the production of advanced electronic devices.
Collaborations
Otake collaborates with talented coworkers, including Takashi Hattori and Hiroyuki Kobayashi. Their combined expertise contributes to the success of their projects and the advancement of technology at Hitachi High-Tech Corporation.
Conclusion
Hiroto Otake's contributions to etching methods have significantly impacted the semiconductor industry. His innovative patents and ongoing work at Hitachi High-Tech Corporation highlight his role as a leading inventor in this field.
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