Hirotaka Tagoshi

Title: Innovations of Hirotaka Tagoshi

Introduction

Hirotaka Tagoshi is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of resist ink compositions and photosensitive materials. With a total of eight patents to his name, Tagoshi's work has advanced the technology used in various applications.

Latest Patents

One of his latest patents is a resist ink composition that includes a compound with at least one oxetanyl group and one epoxy group. This composition is capable of initiating cationic polymerization when exposed to active energy rays or heat. It boasts high photosensitivity and allows for final curing through brief heating, resulting in a cured film with excellent physical properties. Another notable patent involves photosensitive compositions that are prepared without chromium compounds. These compositions demonstrate high resolution and satisfactory sensitivity while being environmentally friendly. They contain a water-soluble azide compound that acts as a photocrosslinking agent, along with poly(N-vinylacetamide) that is photocrosslinkable in the presence of the azide compound.

Career Highlights

Throughout his career, Hirotaka Tagoshi has worked with notable companies such as Showa Denko K.K. and Showa Denko Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in developing innovative materials and technologies.

Collaborations

Tagoshi has collaborated with several professionals in his field, including Haruo Yoshida and Satoshi Maruyama. These collaborations have further enriched his research and development efforts.

Conclusion

Hirotaka Tagoshi's contributions to the field of resist ink compositions and photosensitive materials highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to both performance and environmental responsibility.