Showa Denko K.k.

Showa Denko Kabushiki Kaisha

Other

Sumitomo Seika Chemicals Co., Ltd.

Showa Highpolymer Co., Ltd.

Hirotaka Tagoshi

Haruo Yoshida

Tetsuhiko Yamaguchi

Satoshi Maruyama

Naoki Minorikawa

Kazuto Abe

Tsutomu Arakawa

Minoru Takeda

Shintaro Inazawa

Takashi Sato

Masaharu Watanabe

Noriaki Tochizawa

Takeo Watanabe

Katsuaki Tsutsumi

Masahiro Ueno

Yasuhiro Mikawa

Susumu Tago

Yasushi Morohashi

Hiroyuki Hagi

Yukio Okamoto

Toshiaki Tanikoshi

Takanori Futami

The present invention provides a resist ink composition comprising a compound (a) having at least one oxetanyl group and at least one epoxy group within the same molecule and a compound (b) capable of initiating cationic polymerization under irradiation by an active energy ray and/or under heat. This resist ink composition has high photosensitivity and enables the final curing by a brief heating and the cured film exhibits good physical properties.

Resist ink composition

Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.

Photosensitive compositions and pattern formation method

Disclosed is a composition comprising a plant capable of growing in the presence of at least water and light, a nonionic water-absorptive polymer, and water, and a method of use of the composition as well as a method of fabricating a revegetation material.

Plant-containing composition

A high-flow concrete additive comprises a polymer of 10-100 wt % of an N-vinylacetamide, 0-50 wt % of a compound CH.sub.2 .dbd.CR.sup.3 X.sup.1 R.sup.4 SO.sub.3 X.sup.2 wherein R.sup.3 is hydrogen or methyl, R.sup.4 is alkylene of 1 to 4 carbon atoms, X.sup.1 is CONH or COO, and X.sup.2 is hydrogen, an alkali metal, ammonium salt or organic ammonium salt, and 0-40 wt % of a compound CH.sub.2 .dbd.CR.sup.5 X.sup.3 wherein R.sup.5 is hydrogen or methyl and X.sup.3 is CN, COOR.sup.6, CONH.sub.2, CONHR.sup.7, CONR.sup.8 R.sup.9, COR.sup.10, OCOR.sup.11 or OR.sup.12, in which R.sup.6 is hydrogen, an alkali metal, ammonium salt, organic ammonium salt or alkyl group of 1 to 4 carbon atoms, R.sup.7, R.sup.8 and R.sup.9 are alkyl groups of 1 to 4 carbon atoms, and R.sup.10, R.sup.11 and R.sup.12 are alkyl groups of 1 to 4 carbon atoms.

Terpolymers of unsaturated sulfonates, N-vinylamides and ethylenic

Resin composition and a molded article utilizing it

A method of producing a curable composition containing a prepolymer having a polythioether skeleton, characterized by comprising addition reacting (A) 4,4'-bis(methacryloylthio)-diphenylsulfide having the formula (I): ##STR1## wherein R is a polyvalent organic group composed of an aliphatic or aromatic hydrocarbon and n represents an integer of 2 or more, with the functional group equivalent ratio of the mercapto groups of the component (B) (ii) to the methacryloyl groups of the component (A) being from 0.02 to 1.01, in another vinyl monomer copolymerizable with 4,4'-bis(methacryloylthio)diphenylsulfide having the above formula (I) in the presence of a base catalyst.

Method of producing a curable composition containing

4,4'-bis(methacryloylthio)diphenylsulfide

Polymerizable compositions capable of giving transparent resin having a high refractive index of at least 1.57 which are useful as optical materials and glass adhesives are disclosed. The compositions comprise a mono(meth)acrylate having a biphenyl skeleton and a di(meth)acrylate having a biphenyl skeleton or a bisphenol skeleton. The compositions cure rapidly, particularly under irradiation of ultraviolet light.

Biphenyloxy mono- and dimethacrylate polymerizable compositions

Growing community of inventors

Chiba, Japan

Hirotaka Tagoshi