The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2002
Filed:
Jan. 02, 2001
Applicant:
Inventors:
Masaharu Watanabe, Chiba, JP;
Noriaki Tochizawa, Chiba, JP;
Hirotaka Tagoshi, Chiba, JP;
Tetsuhiko Yamaguchi, Kanagawa, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/012 ; G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/012 ; G03F 7/30 ;
Abstract
Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
Watanabe, Masaharu. (2002). Photosensitive compositions and pattern formation method (U.S. Patent No. 6342330). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6342330
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile