Hiroshige Uchida

Title: Hiroshige Uchida: Innovator in Plasma Processing Technology

Introduction

Hiroshige Uchida is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

Uchida's latest patents include a method for etching a sample and an etching endpoint determination method. The method for etching a sample provides a way to perform mass production processing while maintaining a stable processing profile. This method utilizes a vacuum processing reactor equipped with various components, including a gas supply apparatus and a plasma generating means. It also involves monitoring plasma emissions to control the plasma heating step effectively.

The etching endpoint determination method focuses on accurately detecting a microscopic change in luminous intensity near the etching endpoint. This method involves sampling light emitted by the plasma and computing a regression line based on the luminous intensity data. The endpoint of etching processing is determined by analyzing the distances in the time-base direction between the regression line and the acquired data.

Career Highlights

Uchida is currently employed at Hitachi High-Technologies Corporation, where he continues to develop and refine his innovative technologies. His work has significantly impacted the efficiency and effectiveness of plasma processing in various applications.

Collaborations

Uchida has collaborated with notable coworkers, including Kousa Hirota and Yasuhiro Nishimori. Their combined expertise has contributed to advancements in the field of plasma processing technology.

Conclusion

Hiroshige Uchida's contributions to plasma processing technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to shape the industry and improve processing techniques.