Company Filing History:
Years Active: 2008-2010
Title: Hiroshi Tsunasawa: Innovator in Laser Beam Technology
Introduction
Hiroshi Tsunasawa is a prominent inventor based in Kyoto-fu, Japan. He has made significant contributions to the field of laser beam technology, holding 2 patents that showcase his innovative approach to semiconductor processing.
Latest Patents
His latest patents include the "Laser Beam Projection Mask" and the "Laser Beam Machining Method and Laser Beam Machine Using Same." The laser beam projection mask features three rectangular-shaped slits as transmission areas, which are formed in sequence in the X direction at specified intervals. The width in the X direction decreases in the order of the slits, and the transmission coefficients of these areas change in accordance with a temperature distribution curve of a silicon film. The second patent involves a semiconductor thin film crystallization device, where a first laser beam is emitted in a pulsed manner and converged onto a substrate to form a slit-like beam spot. A second laser beam is emitted to rise and fall around the first beam, allowing for the crystallization of a semiconductor thin film that results in a flat surface with minimal defects.
Career Highlights
Hiroshi Tsunasawa is associated with Sharp Kabushiki Kaisha Corporation, where he continues to develop cutting-edge technologies. His work has significantly advanced the efficiency and quality of semiconductor manufacturing processes.
Collaborations
He has collaborated with notable coworkers, including Junichiro Nakayama and Yoshihiro Taniguchi, contributing to various projects that enhance the capabilities of laser technology in industrial applications.
Conclusion
Hiroshi Tsunasawa's innovative work in laser beam technology has positioned him as a key figure in the semiconductor industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.