Hiroshi Sudoh

Title: Hiroshi Sudoh: Innovator in Cobalt Base Film Technology

Introduction

Hiroshi Sudoh is a notable inventor based in Koganei, Japan. He has made significant contributions to the field of film-forming methods, particularly focusing on cobalt-based technologies. His innovative approach has led to advancements that enhance the quality and efficiency of film formation processes.

Latest Patents

Hiroshi Sudoh holds 1 patent for his invention titled "Cobalt base film-forming method, cobalt base film-forming material, and novel compound." This patent presents a technique for easily forming a high-quality cobalt base film with a small specific resistance. The invention includes a transportation process of Co[i-C3H7NC(C2H5)N-i-C3H7]2 and a film formation process that involves the decomposition of this compound. The process consists of a first film formation phase, where the chamber is supplied with NH3 and/or NH3 product compounds without H2, and a second phase that includes H2, with varying internal pressures in each phase.

Career Highlights

Throughout his career, Hiroshi Sudoh has worked with prominent companies such as Gas-phase Growth Ltd. and Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the field of film formation.

Collaborations

Hiroshi has collaborated with notable colleagues, including Hideaki Machida and Masato Ishikawa. These partnerships have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Hiroshi Sudoh's contributions to cobalt base film technology exemplify the impact of innovative thinking in the field of materials science. His patent and career achievements highlight the importance of collaboration and expertise in driving technological advancements.