Hiroshi Shinriki

Title: Hiroshi Shinriki: Innovator in Semiconductor Manufacturing

Introduction

Hiroshi Shinriki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 6 patents. His work has been instrumental in advancing technologies that are crucial for modern electronic devices.

Latest Patents

Shinriki's latest patents include a process for manufacturing semiconductor devices. This process involves several key steps, such as forming a first electrode composed of tantalum and tungsten over a semiconductor substrate, depositing a dielectric film of tantalum oxide on the first electrode, oxidizing both the first electrode and the dielectric film, and finally forming a second electrode over the dielectric film. Another notable patent is a method of manufacturing a semiconductor device that utilizes a MOSFET containing a tantalum pentoxide film as a gate insulating film. This method applies ion implantation to ensure that the end of the insulating film is positioned outside the gate electrode, effectively preventing issues like short-circuiting and enhancing the reliability of the MOSFET without the need for light oxidation.

Career Highlights

Hiroshi Shinriki is currently employed at Hitachi, Ltd., where he continues to innovate in semiconductor technology. His expertise and dedication have made him a valuable asset to the company and the industry as a whole.

Collaborations

Shinriki has collaborated with notable coworkers such as Kiichiro Mukai and Yasushiro Nishioka. Their combined efforts have contributed to the development of advanced semiconductor technologies.

Conclusion

Hiroshi Shinriki's work in semiconductor manufacturing exemplifies the spirit of innovation. His patents and contributions have significantly impacted the field, paving the way for future advancements in technology.