This inventor holds 3 USPTO granted patents. Top assignees: Mitsubishi Materials Silicon Corporation, Nihon Radiator Co., Ltd., Nissan Motor Company Limited. Active years: 1989-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
2 out of 51 
1 out of 49 
1 out of 13,420 
Years Active: 1989-2004
Title: Hiroshi Shimamura: Innovator in Dielectrically Separated Wafer Technology
Introduction
Hiroshi Shimamura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of dielectrically separated wafers. With a total of 3 patents to his name, Shimamura's work has paved the way for advancements in device fabrication.
Latest Patents
Hiroshi Shimamura's latest patents include innovative methods related to dielectrically separated wafers. One of his notable inventions is a dielectrically separated wafer and a method of manufacturing the same. This invention allows for the expansion of the device fabrication surface area of dielectrically separated silicon islands by laminating a low concentration impurity layer on a high concentration impurity layer. Another significant patent focuses on growing a polysilicon layer without producing voids in the dielectrically separating oxide layer. This method involves forming a seed polysilicon layer at low temperature and under low pressure, followed by a high-temperature polysilicon layer. Additionally, he has developed a method to flatten the surface between dielectrically separated islands by polishing the wafer surface to achieve a flat surface without projections or indentations.
Career Highlights
Throughout his career, Hiroshi Shimamura has worked with notable companies such as Mitsubishi Materials Silicon Corporation and Nissan Motor Company Limited. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Hiroshi has collaborated with talented individuals in his field, including Hiroyuki Oi and Kazuya Sato. These collaborations have further enhanced his research and development efforts.
Conclusion
Hiroshi Shimamura's contributions to the field of semiconductor technology, particularly through his patents on dielectrically separated wafers, demonstrate his innovative spirit and commitment to advancing technology. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile