This inventor holds 2 USPTO granted patents. Top assignees: Fuji Photo Film Company, Limited, Takata Corporation. Active years: 1993-1996.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993-1996
Title: Hiroshi Satoh: Innovator in Heat-Sensitive Materials and Ion Implantation Methods.
Introduction
Hiroshi Satoh is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the fields of heat-sensitive materials and ion implantation methods. With a total of 2 patents, his work showcases innovative approaches to technology.
Latest Patents
Hiroshi Satoh's latest patents include a multi-color heat-sensitive recording material. This invention comprises a support with multiple laminated heat-sensitive color forming layers. The first layer includes an electron donating dye precursor and an electron accepting compound. The second layer contains a diazonium salt compound with a specific absorption wavelength and a coupler that reacts to form color upon heating. The third layer also features a diazonium salt compound and a coupler, designed to create color through a similar heating process. His other patent involves an ion implantation method that utilizes a deflected ion beam to implant ions at precise angles on the surface of a hole's inner periphery.
Career Highlights
Throughout his career, Hiroshi Satoh has worked with prominent companies such as Fuji Photo Film Company, Limited and Takata Corporation. His experience in these organizations has contributed to his expertise in developing innovative technologies.
Collaborations
Hiroshi has collaborated with notable coworkers, including Tetunori Matsushita and Hiroshi Kamikawa. Their joint efforts have likely fostered advancements in their respective fields.
Conclusion
Hiroshi Satoh's contributions to innovation in heat-sensitive materials and ion implantation methods highlight his role as a significant inventor. His patents reflect a commitment to advancing technology and improving existing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

