The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1993
Filed:
Oct. 28, 1992
Takata Corporation, Tokyo, JP;
Abstract
An ion implantation method for implanting ions by irradiating an ion beam 18 on the surface of the inner periphery 17a of a hole, characterized in that the ion beam 18 is deflected by magnetic field applied to the inside of the hole to irradiate the beam on the surface of the inner periphery 17a of the hole with an incident angle at or close to right angles. An ion implantation method for implanting ions by irradiating an ion beam 18 on the surface of the inner periphery 17a of a hole, characterized in that the ion beam 18 is irradiated on the surface of the inner periphery 17a of the hole with an incident angle at or close to right angles by inserting a lead-in tube for the ion beam to the inside of the hole and by deflecting the ion beam 18 by applying a voltage having a reverse potential to the ions on the inner surface of the hole.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile