This inventor holds 4 USPTO granted patents. Top assignees: W. R. Grace Co.-Conn., Macdermid Acumen, Inc.. Active years: 1995-1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kanagawa, JP (1995 - 1996)
- Kanagawa-ken, JP (1996 - 1999)
Company Filing History:
Years Active: 1995-1999
Title: Hiroshi Samukawa: Innovator in Waterborne Photoresist Technology
Introduction
Hiroshi Samukawa is a notable inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of waterborne emulsions. With a total of 4 patents to his name, Samukawa's work has advanced the capabilities of photoresist materials used in various applications.
Latest Patents
One of his latest patents is titled "Waterborne photoresist emulsions and methods of preparation thereof." This invention focuses on creating highly versatile and stable photoresist emulsions using low levels of neutralization while minimizing the use of surfactants and associative thickeners. The process involves mixing and comminuting a partially neutralized acid functional latex polymer resin with photopolymerizable monomers and photoinitiators to produce a stable emulsion with high solids and low viscosity.
Another significant patent is the "Process for preparing photosensitive resin composition." This invention provides a method for creating a waterborne photosensitive resin composition that is free of organic solvents and can be developed with an aqueous alkali solution. The process includes adding an unsaturated compound, a surfactant, and a photoinitiator to an aqueous emulsion, agitating it under specific conditions to form a stable waterborne photosensitive resin composition.
Career Highlights
Throughout his career, Hiroshi Samukawa has worked with reputable companies, including W.R. Grace & Co. and MacDermid Acumen, Inc. His experience in these organizations has contributed to his expertise in the field of photoresist technology.
Collaborations
Samukawa has collaborated with notable professionals in his field, including Yoshichi Hagiwara and John Scott Hallock. These collaborations have likely enriched his research and development efforts, leading to innovative solutions in photoresist technology.
Conclusion
Hiroshi Samukawa's contributions to the field of photoresist technology, particularly through his innovative patents, have established him as a key figure in this area. His work continues to influence advancements in materials used for various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile