The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 1996

Filed:

Jun. 06, 1995
Applicant:
Inventors:

Keiichi Kinashi, Kanagawa, JP;

Hiroshi Samukawa, Kanagawa, JP;

Reiko Chiba, Kanagawa, JP;

Assignee:

W. R. Grace & Co.-Conn., New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
522100 ; 522 39 ; 525502 ; 525531 ;
Abstract

This invention provides a photosensitive resin composition which can be developed using water and can form a resist layer having superior hardness, adhesion and water resistance. The photosensitive resin composition of the present invention is characterized by containing an unsaturated epoxyester compound prepared by esterifying some of the epoxy side groups of an unsaturated epoxyester compound, and then reacting the remained epoxy groups of the epoxyester compound with a tertiary amine and acid component, such as phosphoric acid, a monoester of phosphoric acid or a diester of phosphoric acid or combination thereof, to convert the epoxy groups into quaternary ammonium salt groups having phosphate anions.


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Kinashi, Keiichi. (1996). Unsaturated epoxy ester with quaternary ammonium and phosphate groups (U.S. Patent No. 5512607). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5512607

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