Location History:
- Kodaira, JP (1980 - 1981)
- Higashikurume, JP (1986 - 1994)
Company Filing History:
11 out of 42,508 
2 out of 7 
1 out of 21 Years Active: 1980-1994
Title: Hiroshi Nishizuka: Innovator in Wafer Technology
Introduction
Hiroshi Nishizuka is a prominent inventor based in Higashikurume, Japan. He has made significant contributions to the field of semiconductor technology, particularly in wafer production. With a total of 11 patents to his name, Nishizuka has developed innovative methods that enhance the quality and performance of wafers used in various applications.
Latest Patents
One of his latest patents is a method of producing a wafer having a curved notch. This invention features a wafer with chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion, such as an orientation flatness. This design prevents chipping of the wafer and allows for better coating with photoresist. Additionally, it facilitates the formation of an epitaxially grown layer on the wafer, ensuring that films with desired characteristics can be provided on the wafer's surface.
Career Highlights
Throughout his career, Hiroshi Nishizuka has worked with notable companies, including Hitachi, Ltd. and Hitachi Ome Electronic Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in wafer technology.
Collaborations
Nishizuka has collaborated with esteemed colleagues such as Susumu Komoriya and Hisashi Maejima. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Hiroshi Nishizuka's contributions to wafer technology have significantly impacted the semiconductor industry. His innovative methods and collaborations with other experts highlight his dedication to advancing this field.