The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 1988
Filed:
Sep. 23, 1987
Koyo Morita, Higashimurayama, JP;
Keizo Nomura, Higashiyamato, JP;
Hiroshi Nishizuka, Higashikurume, JP;
Tai Hoshi, Koganei, JP;
Yoichiro Tamiya, Higashimurayama, JP;
Terushige Asakawa, Koganei, JP;
Hitachi, Ltd, Tokyo, JP;
Hitachi Ome Electronic Co., Inc., Tokyo, JP;
Abstract
A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.