Location History:
- Tosu, JP (2011)
- Kasuga, JP (2011 - 2012)
Company Filing History:
Years Active: 2011-2012
Title: Hiroshi Nagayasu: Innovator in Substrate Processing Technologies
Introduction
Hiroshi Nagayasu, an accomplished inventor located in Kasuga, Japan, has made significant contributions to the field of substrate processing. With a total of three patents to his name, his innovative approaches have addressed critical challenges in the industry, particularly in enhancing efficiency and reducing costs in substrate processing methods.
Latest Patents
Hiroshi Nagayasu's latest patents reflect his dedication to advancing technology in substrate processing. The first patent focuses on a substrate processing method and apparatus designed to prevent the generation of watermarks on substrates while maintaining cost-effectiveness. This method involves controlling the ambient humidity around the substrate based on the type of chemical liquid being used, particularly during the drying steps. By managing the humidity effectively, the patented process ensures that the substrate is processed with minimal defects.
His second patent involves a liquid processing apparatus and method capable of planarizing a film on a substrate. The apparatus uses a rotating substrate holding member and a dual liquid supply mechanism that delivers the process liquid through nozzles of differing diameters. This innovative design facilitates efficient and precise processing, allowing for improved film dissolution and substrate treatment effectiveness.
Career Highlights
Hiroshi Nagayasu is currently employed at Tokyo Electron Limited, a prominent company in the semiconductor industry. His work there encompasses the development and enhancement of cutting-edge technologies that aim to optimize substrate processing techniques. His innovative contributions have played a key role in advancing the capabilities of semiconductor manufacturing processes.
Collaborations
Throughout his career, Nagayasu has collaborated with notable colleagues, including Hiromitsu Nanba and Masahiro Yoshida. Together, they have pushed the boundaries of what is possible in substrate processing and have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Hiroshi Nagayasu’s work in substrate processing exemplifies the impact of innovating traditional methodologies to foster efficiency and quality in manufacturing. His recent patents underscore his commitment to enhancing industrial processes, ensuring that he remains a significant figure in the world of inventions and technology. Through his endeavors at Tokyo Electron Limited and collaborations with esteemed colleagues, Nagayasu continues to contribute to the evolution of substrate processing technologies.