Location History:
- Hyogo, JP (1990)
- Itami, JP (1995)
- Tokyo, JP (2000)
Company Filing History:
Years Active: 1990-2000
Title: Hiroshi Miyatake: Innovator in Semiconductor Manufacturing
Introduction
Hiroshi Miyatake is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His innovative approaches have led to advancements in contact structures and phase shift mask patterns.
Latest Patents
Miyatake's latest patents include a method for manufacturing contact structures that prevent erosion in the contact area between wires and conductors. This method involves forming an interlayer insulating film with a wire burying hole, where a conductor is buried. A wire layer is then created to cover the hole, utilizing a resist as a mask to achieve a borderless structure. Additionally, he has developed a method for mending defects in phase shift patterns. This method addresses black and white defects in phase shift mask patterns, ensuring that the mended patterns maintain accurate definitions.
Career Highlights
Hiroshi Miyatake is associated with Mitsubishi Electric Corporation, where he has been instrumental in driving innovation in semiconductor technologies. His work has not only enhanced manufacturing processes but has also contributed to the overall efficiency and effectiveness of semiconductor devices.
Collaborations
Miyatake has collaborated with notable colleagues, including Katsuhiro Tsukamoto and Masahiro Shimizu. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Hiroshi Miyatake's contributions to semiconductor manufacturing through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and manufacturing processes.