Hiroshi Miroku

Title: Hiroshi Miroku: Innovator in Semiconductor Metrology

Introduction

Hiroshi Miroku is a prominent inventor based in Mie, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of metrology. His innovative work has led to the development of a unique method that enhances process control in semiconductor fabrication.

Latest Patents

Hiroshi Miroku holds a patent for a "Method, system and computer program product for 3D-NAND CDSEM metrology." This patent describes a method for process control of a semiconductor structure fabricated through a series of fabrication steps. The method involves obtaining an image of the semiconductor structure that reflects at least two individual fabrication steps. The image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from it. A hardware processor then processes the image to determine parameters of the semiconductor structure, including measuring specific steps from the fabrication process as individual features. He has 1 patent to his name.

Career Highlights

Hiroshi Miroku is currently employed at Applied Materials Israel Limited, where he continues to push the boundaries of semiconductor technology. His work is instrumental in advancing the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

Hiroshi collaborates with talented professionals in his field, including Roman Kris and Roi Meir. Their combined expertise contributes to the innovative projects at Applied Materials Israel Limited.

Conclusion

Hiroshi Miroku's contributions to semiconductor metrology exemplify the impact of innovation in technology. His patent and ongoing work at Applied Materials Israel Limited highlight his role as a key figure in advancing semiconductor fabrication processes.