This inventor holds 1 USPTO granted patent. Top assignees: Adtec Plasma Technology Co., Ltd., Hitachi-Kokusai Electric Inc., Other. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 6 
1 out of 1,258 
1 out of 834,570 Years Active: 2009
Title: Hiroshi Mase: Innovator in Plasma and Ozone Generation
Introduction
Hiroshi Mase is a notable inventor based in Hitachi-shi, Ibaraki, Japan. He has made significant contributions to the field of plasma and ozone generation, particularly in the development of efficient and user-friendly technologies. His innovative approach has led to the creation of a patent that addresses the challenges associated with plasma generation.
Latest Patents
Hiroshi Mase holds a patent for a plasma generator, ozone generator, substrate processing apparatus, and manufacturing method of semiconductor devices. The invention aims to provide a generator capable of generating plasma and ozone with high efficiency and ease of handling, featuring a simple structure. The design includes an electrode part formed of electrodes without dielectric material interposed between them. An arc-extinguishing capacitor serves as a charge storage component, connected in series to the electrode part. An AC power source generates plasma by causing self-arc-extinguishing discharge between the electrodes while applying AC voltage to charge and discharge the arc-extinguishing capacitor. This innovative design allows for a multi-polarized electrode part, enhancing the overall efficiency of the device.
Career Highlights
Throughout his career, Hiroshi Mase has worked with prominent companies in the technology sector, including Hitachi Kokusai Electric Inc. and Adtec Plasma Technology Co., Ltd. His experience in these organizations has contributed to his expertise in plasma technology and semiconductor manufacturing.
Collaborations
Hiroshi Mase has collaborated with notable colleagues such as Noriyoshi Sato and Takeshi Taniguchi. Their combined efforts have further advanced the field of plasma generation and its applications.
Conclusion
Hiroshi Mase's contributions to the field of plasma and ozone generation demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in creating efficient and manageable solutions for semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile