This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Asm IP Holding B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Hiroshi Kou: Innovator in Material Deposition Technologies
Introduction
Hiroshi Kou is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of material deposition technologies. His innovative approaches have led to advancements in how materials are applied to substrates, enhancing various industrial processes.
Latest Patents
Hiroshi Kou holds a patent for a method of depositing condensable material onto a surface of a substrate. This patent, titled "Methods of depositing material onto a surface of a substrate," outlines exemplary methods that include flowing a gas-phase precursor within a reaction chamber. The process involves condensing the precursor onto the substrate's surface to form condensed material, followed by curing the condensed material to transform it into a cured state. Notably, the curing step can utilize a plasma process and may involve the use of a reactant. He has 1 patent to his name.
Career Highlights
Hiroshi Kou is associated with Asm IP Holding B.V., where he continues to develop and refine his innovative techniques. His work has been instrumental in advancing the capabilities of material deposition, which is crucial for various applications in technology and manufacturing.
Collaborations
Due to space constraints, the details of collaborations will not be included.
Conclusion
Hiroshi Kou's contributions to material deposition technologies reflect his dedication to innovation and excellence in his field. His patent showcases his expertise and commitment to advancing industrial processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile