The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Jul. 05, 2023
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Hiroshi Kou, Tokyo, JP;
Hideaki Fukuda, Hachioji, JP;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/34 (2006.01); H10P 14/60 (2026.01); H10P 14/694 (2026.01);
U.S. Cl.
CPC ...
H10P 14/6682 (2026.01); C23C 16/345 (2013.01); H10P 14/6336 (2026.01); H10P 14/6339 (2026.01); H10P 14/69433 (2026.01);
Abstract
Methods of depositing material onto a surface of a substrate. Exemplary methods include flowing a gas-phase precursor within the reaction chamber, condensing the precursor onto the surface of the substrate to form condensed material, and curing the condensed material to transform the condensed material to cured material. The step of curing can be a plasma process and can include use of a reactant.