Company Filing History:
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Title: Hiroshi Kadowaki: Innovator in Semiconductor Technology
Hiroshi Kadowaki is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.
Latest Patents
Hiroshi Kadowaki holds a patent for a semiconductor device and its manufacturing method. This invention focuses on the removal of reaction products that occur during the etching of a semiconductor sample using a reactive gas. The method involves using a liquid chemical containing sulfuric acid and hydrofluoric acid in a specific volume mixing ratio, maintained at temperatures between 25°C and 70°C. Additionally, the patent describes a process for simultaneously removing reaction products and a resist mask using a liquid chemical that includes sulfuric acid, a hydrogen peroxide solution, and hydrofluoric acid, kept at temperatures between 70°C and 100°C.
Career Highlights
Throughout his career, Hiroshi Kadowaki has worked with prominent companies in the semiconductor industry. He has been associated with Mitsubishi Electric Corporation and Ryoden Semiconductor System Engineering Corporation. His experience in these organizations has contributed to his expertise in semiconductor manufacturing processes.
Collaborations
Hiroshi Kadowaki has collaborated with various professionals in his field. One notable coworker is Takatoshi Kinoshita, with whom he has shared insights and advancements in semiconductor technology.
Conclusion
Hiroshi Kadowaki's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry and inspire future innovations.