Hiroshi Amari is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of photographic materials and ultrafine pattern formation. With a total of five patents to his name, Amari's work showcases his innovative spirit and technical expertise.

Latest Patents

One of Amari's latest patents is a process for forming an ultrafine pattern on a substrate surface. This process involves irradiating the substrate with modulated radiation, followed by deposition with a reactive or non-reactive material, and etching if a substrate-reactive material is used. This method allows for the easy formation of ultrafine patterns with high accuracy. Another significant patent involves the production of a photographic material. This process includes dispersing a material incompatible with an organic resin in a solution, coating it on a support, and drying the layer to create a photographic material containing solid particles.

Career Highlights

Hiroshi Amari is currently associated with Fuji Photo Film Company, Limited, where he continues to develop innovative solutions in his field. His work has been instrumental in advancing the technology behind photographic materials and pattern formation.

Collaborations

Amari has collaborated with notable coworkers, including Ryuji Shirahata and Tatsuji Kitamoto, contributing to various projects that enhance the capabilities of photographic technologies.

Conclusion

Hiroshi Amari's contributions to the fields of photographic materials and ultrafine pattern formation highlight his role as a leading inventor. His innovative processes and collaborations continue to influence advancements in technology.

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