The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 1986
Filed:
Nov. 08, 1985
Applicant:
Inventors:
Tatsuji Kitamoto, Kanagawa, JP;
Hiroshi Amari, Tokyo, JP;
Akira Nahara, Kanagawa, JP;
Ryuji Shirahata, Kanagawa, JP;
Yoshihiro Arai, Kanagawa, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156628 ; 156635 ; 156643 ; 156646 ; 156653 ; 156656 ; 156657 ; 156662 ; 1566591 ; 2041923 ; 2191 / ; 2191 / ; 2504921.492.2 ; 2504923 ; 427 35 ; 427 431 ; 427 531 ;
Abstract
A process for forming an ultrafine pattern on a surface of a substrate, which includes steps of irradiating the substrate surface with radiation modulated according to information to be patterned, subjecting the substrate surface to deposition with a material reactive or not with the substrate, and subjecting the substrate surface to etching if a substrate-reactive material is used for deposition. By this process, an ultrafine pattern can easily be formed with a high accuracy.