Company Filing History:
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Years Active: 2019-2023
Title: Innovations of Hiroo Hasebe
Introduction
Hiroo Hasebe is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of ion beam technology, particularly through his innovative patents. With a total of 2 patents, Hasebe's work focuses on enhancing the efficiency and safety of charge stripping devices.
Latest Patents
Hasebe's latest patents include a rotary charge stripping film in a charge stripping device of ion beam and a charge stripping method of ion beam. The objective of these inventions is to provide a charge stripping film that exhibits high heat resistance and non-toxicity. This innovation ensures that there is no risk of activation while allowing an ion beam to become multivalent, even with a thin charge stripping film. The charge stripping film is designed to withstand high-energy beam radiation over extended periods. It comprises a carbon film with a thermal conductivity of 20 W/mK or more, with a thickness ranging from more than 3 μm to less than 10 μm. Additionally, the charge stripping film produced by a polymer annealing method also falls within this thickness range.
Career Highlights
Throughout his career, Hiroo Hasebe has worked with prominent companies such as Kaneka Corporation and Riken Corporation. His experience in these organizations has contributed to his expertise in the field of ion beam technology.
Collaborations
Hasebe has collaborated with notable coworkers, including Mutsuaki Murakami and Masamitsu Tachibana. Their joint efforts have further advanced the innovations in charge stripping technology.
Conclusion
Hiroo Hasebe's contributions to ion beam technology through his patents demonstrate his commitment to innovation and safety in the field. His work continues to influence advancements in charge stripping devices, showcasing the importance of research and development in this area.