Kaneka Corporation

Riken Corporation

Hiroo Hasebe

Mutsuaki Murakami

Masamitsu Tachibana

Atsushi Tatami

An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25&#xb0; C., and a film thickness of the carbon film is more than 3 &#x3bc;m and less than 10 &#x3bc;m. The present invention also comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film produced by a polymer annealing method, and a film thickness of the carbon film is more than 3 &#x3bc;m and less than 10 &#x3bc;m.

Rotary charge stripping film in charge stripping device of ion beam and charge stripping method of ion beam

A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 &#x3bc;m to 150 &#x3bc;m, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25&#xb0; C. of at least 300 W/mK, and has a film thickness of 10 &#x3bc;m to 150 &#x3bc;m, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%.

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Saitama, Japan

Hiroo Hasebe