This inventor holds 3 USPTO granted patents. Top assignees: Japan Energy Corporation, Nippon Mining Co., Ltd.. Active years: 1992-1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1992-1998
Title: Hironori Wada: Innovator in Thin-Film Technology
Introduction
Hironori Wada is a notable inventor based in Kitaibaraki, Japan. He has made significant contributions to the field of thin-film technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of thin-film forming apparatuses.
Latest Patents
Wada's latest patents include a thin-film forming apparatus that features a collimator with a particle getter function. This innovative collimator is designed by assembling particle getter sheets into a lattice or honeycomb structure, which is then fixed into a frame. The collimator effectively captures and holds particles, ensuring that the film deposited on it does not peel off while maintaining optimal performance. Another significant patent is for silicide targets used in sputtering, which are engineered to minimize particle generation during the sputtering process. These targets have a specific area ratio of silicon phases and a controlled surface roughness, contributing to improved manufacturing processes.
Career Highlights
Throughout his career, Wada has worked with prominent companies such as Japan Energy Corporation and Nippon Mining Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative technologies in thin-film applications.
Collaborations
Wada has collaborated with notable colleagues, including Junichi Anan and Susumi Sawada. Their combined expertise has contributed to advancements in the field of thin-film technology.
Conclusion
Hironori Wada's contributions to thin-film technology through his patents and collaborations highlight his role as a significant innovator in this field. His work continues to influence advancements in manufacturing processes and materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile