Itami, Japan

Hiromitsu Onishi

This inventor holds 1 USPTO granted patent. Top assignee: Osaka Sanso Kogyo Ltd.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiromitsu Onishi. Retrieved from https://idiyas.com/inventor/hiromitsu-onishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Hiromitsu Onishi: Innovator in Soldering Technology

Introduction

Hiromitsu Onishi is a notable inventor based in Itami, Japan. He has made significant contributions to the field of soldering technology, particularly in methods that enhance the efficiency and effectiveness of surface mounting for printed circuit boards.

Latest Patents

Onishi holds a patent for a method of soldering using a special atmospheric gas. This innovative technique involves performing reflow soldering with a rosin-based cream solder in an atmosphere that includes inert gases such as nitrogen (N₂), argon (Ar), or helium (He). The method is characterized by containing about 10,000 ppm or less of oxygen and 0.5-3.0% of moisture, which optimizes the soldering process.

Career Highlights

Hiromitsu Onishi is associated with Osaka Sanso Kogyo Ltd., where he has applied his expertise in soldering technology. His work has been instrumental in advancing the methods used in the electronics manufacturing industry.

Collaborations

Onishi has collaborated with notable colleagues, including Yoshiharu Tsujimoto and Iku Takenaka. Their combined efforts have contributed to the development of innovative solutions in soldering techniques.

Conclusion

Hiromitsu Onishi's contributions to soldering technology reflect his commitment to innovation and excellence in the field. His patented methods continue to influence the electronics industry, showcasing the importance of advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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