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Years Active: 2003-2011
Title: Hiromichi Waki: Innovator in Semiconductor Technology
Introduction
Hiromichi Waki is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work has had a profound impact on the manufacturing processes of integrated circuit devices.
Latest Patents
One of his latest patents is a method for manufacturing a semiconductor integrated circuit device. This invention addresses the challenges associated with the resist film after high-concentration ion implantation. The resist film develops a hard modified layer on its surface, which becomes difficult to remove at lower temperatures. Waki's method involves increasing the temperature to about 250 degrees centigrade for an ashing treatment in a vacuum, enhancing the etching rate of the modified layer. Additionally, he has developed a ferroelectric memory device, showcasing his innovative approach to semiconductor applications.
Career Highlights
Throughout his career, Hiromichi Waki has worked with prominent companies such as Hitachi, Ltd. and Renesas Technology Corporation. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various advancements in the field.
Collaborations
Waki has collaborated with notable colleagues, including Keiichi Yoshizumi and Mitsuhiro Mori. Their combined efforts have further propelled innovations in semiconductor manufacturing processes.
Conclusion
Hiromichi Waki's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in integrated circuit devices and memory technologies.