This inventor holds 5 USPTO granted patents. Top assignees: Tdk Corporation, Other. Active years: 1997-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Saku, JP (1997 - 2001)
- Tokyo, JP (2005)
Company Filing History:

Years Active: 1997-2005
Title: **Innovations by Hiromichi Kanazawa: A Pioneer in Film Vapor Deposition Methods**
Introduction
Hiromichi Kanazawa, a noteworthy inventor based in Saku, Japan, has significantly contributed to the field of material science with his innovative patents. With a total of five patents to his name, Kanazawa has demonstrated a passion for advancing technology and enhancing industrial processes.
Latest Patents
Among his most recent inventions is the "Film Vapor Deposition Method." This groundbreaking method enables vapor depositing a thin film without thermal damage or degradation caused by heat and electrification during the vapor deposition process. The innovative technique allows for stable movement and vapor deposition of the film while minimizing loss compared to conventional methods. The patented process involves applying a thin film on a long aromatic polyamide film in a vacuum, utilizing a shielding plate to protect the film during the initial stages of heating the vapor deposition material. Once the material is fully melted, the long film can be moved, and the shielding plate is subsequently removed, enhancing the film’s integrity and quality.
Career Highlights
Throughout his career, Kanazawa has gained valuable experience at leading companies, including TDK Corporation. His technical expertise and innovative approach have positioned him as a prominent figure in the industry, with contributions that span multiple aspects of material technology.
Collaborations
Kanazawa has worked alongside talented professionals such as Kunihiro Ueda and Koji Kobayashi, whose collaborations have fostered a creative environment that has facilitated the development of innovative solutions in their field. These partnerships have been instrumental in pushing the boundaries of what is possible in film vapor deposition technology.
Conclusion
Hiromichi Kanazawa continues to be an influential inventor in the realm of material science, with his latest patents reflecting a deep commitment to innovation. His work not only advances industrial applications but also inspires future generations of inventors seeking to make a mark in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile