The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Dec. 20, 2002
Masao Nakayama, Tokyo, JP;
Hiromichi Kanazawa, Tokyo, JP;
Masao Nakayama, Tokyo, JP;
Hiromichi Kanazawa, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
A method of vapor depositing a film is provided wherein the film is not thermally damaged or broken due to the effects of heat and electrification of the film during the heating of a vapor deposition material. The film can be moved and vapor-deposited stably, and a loss of the film can be decreased as compared to the conventional method. The method forms a thin film on a long film, comprising aromatic polyamide, in vacuum. During the heating of the vapor deposition material, the long film stands still or is moved at a very low speed of 1 m/min or less, wherein a shielding plate is placed between the vapor deposition material and the long film. Once the vapor deposition material is completely molten, a substantial movement of the long film is started. At the same time or thereafter, the shielding plate is removed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile