Hiromi Sakima

Title: Inventor Hiromi Sakima: Innovations in Plasma Processing

Introduction

Hiromi Sakima is an accomplished inventor based in Nirasaki, Japan. With a remarkable portfolio of 4 patents, Sakima has made significant contributions to the field of plasma processing technology.

Latest Patents

His latest patents include a plasma processing method and apparatus designed to enhance etching rates without necessitating an additional seasoning process after dry cleaning. This innovative method features a two-step plasma processing within a single chamber and utilizes a dummy substrate for effective dry cleaning between the steps. The process ensures that deposits accumulate during the first processing stage while minimizing them in the second stage. Furthermore, Sakima has developed a method and system for semiconductor processing that employs high purity CF gases in combination with carrier gases like Argon. This method allows for effective etching of oxides and dielectrics while maintaining the integrity of underlying layers.

Career Highlights

Sakima has had a notable career working for well-respected companies, including Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His professional background highlights his expertise in advanced semiconductor technologies and plasma processing systems.

Collaborations

Throughout his career, Sakima has collaborated with other talented professionals in the field, including Masahiro Yamada and Youbun Ito. These partnerships have fostered innovation and contributed to the success of his technological advancements.

Conclusion

In conclusion, Hiromi Sakima's impactful inventions and patents in plasma processing have significantly advanced the semiconductor industry. His dedication to innovation continues to influence practices and technologies that enhance efficiency and effectiveness in multiple applications.