Nakaminato, Japan

Hiromi Isomae


Average Co-Inventor Count = 6.7

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1992-1993

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2 patents (USPTO):Explore Patents

Title: Hiromi Isomae: Innovator in Thick Film Resistor Technology

Introduction

Hiromi Isomae is a notable inventor based in Nakaminato, Japan. He has made significant contributions to the field of electronics, particularly in the development of thick film resistor technology. With a total of 2 patents, Isomae's work has advanced the capabilities of hybrid integrated circuits and surface acoustic wave (SAW) devices.

Latest Patents

Isomae's latest patents include a thick film resistor composition and a hybrid IC utilizing this composition. The thick film resistor material is particularly suitable for hybrid ICs that incorporate conductors, resistors, and semiconductor elements, where copper is used as the conductor. This invention also details a method for creating a thick film hybrid IC that employs the thick film resistor composition as a resistor. Additionally, he has developed a SAW device featuring a piezoelectric substrate with interleaved metal electrodes formed through sputtering. This innovative SAW device is designed to handle high-frequency electric signals of larger amplitudes compared to conventional devices.

Career Highlights

Throughout his career, Isomae has worked with prominent companies such as Hitachi, Ltd. and Hitachi Chemical Company, Ltd. His experience in these organizations has allowed him to refine his expertise in electronic materials and devices.

Collaborations

Isomae has collaborated with notable coworkers, including Akitsuna Yuhara and Jun Sasaki, who have contributed to his research and development efforts.

Conclusion

Hiromi Isomae's contributions to thick film resistor technology and SAW devices have significantly impacted the electronics industry. His innovative patents and collaborations reflect his dedication to advancing technology in this field.

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