Obu, Japan

Hiromasa Hayashi


Average Co-Inventor Count = 2.2

ph-index = 3

Forward Citations = 31(Granted Patents)


Location History:

  • Oobu, JP (2007)
  • Obu, JP (2005 - 2018)
  • Kariya, JP (2021)

Company Filing History:


Years Active: 2005-2021

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11 patents (USPTO):Explore Patents

Title: Hiromasa Hayashi: Innovator in Semiconductor Technology

Introduction

Hiromasa Hayashi is a prominent inventor based in Obu, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His innovative work has paved the way for advancements in electronic devices.

Latest Patents

One of Hayashi's latest patents is a semiconductor device that includes a first chip to restrict current flow in a first direction through a current path. A second chip restricts the current flow in the opposite direction, and the device features a wiring that connects both chips. This wiring acts as a shunt resistor with a resistive body, and the lead frame includes a sense terminal to detect voltage drop across the resistive body. Another notable patent is for an electronic device that comprises first to third terminals and a clip. The clip has joint portions that bond to the terminals, with one terminal featuring a depressed portion to store conductive bonding material. This design allows for the absorption of positional variations through the deformation of the bonding material.

Career Highlights

Hiromasa Hayashi is currently employed at Denso Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the performance and reliability of electronic devices.

Collaborations

Hayashi has collaborated with notable coworkers, including Toshihiro Fujita and Hiroyasu Kidokoro. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Hiromasa Hayashi's contributions to semiconductor technology and electronic devices highlight his role as a leading inventor in the field. His innovative patents and collaborations continue to influence advancements in technology.

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