Kumamoto, Japan

Hiroki Yonekawa

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroki Yonekawa. Retrieved from https://idiyas.com/inventor/hiroki-yonekawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hiroki Yonekawa: Innovator in Substrate Processing Technology

Introduction

Hiroki Yonekawa, an accomplished inventor based in Kumamoto, Japan, is known for his remarkable contributions to substrate processing technology. With a keen focus on enhancing production efficiency in the semiconductor industry, his innovations pave the way for advancements in material processing methods.

Latest Patents

Yonekawa holds a patented invention titled "Substrate Processing Method and Substrate Processing Apparatus." This invention outlines a unique approach that includes an etching process, a temperature-difference forming process, and a rinsing process. The etching process involves supplying an etchant onto a substrate's surface to etch a predefined pattern. Concurrently, the temperature-difference forming process ensures that the temperature in the lower portion of the pattern is reduced, enhancing precision during processing. Finally, the rinsing process replaces any residual etchant with rinse liquid, ensuring a clean and efficient completion of the substrate processing.

Career Highlights

Throughout his career, Yonekawa has established himself as a key player in the semiconductor field. His role at Tokyo Electron Limited, a renowned company in the industry, has allowed him to leverage his expertise to drive innovations and improve manufacturing processes. His passion for technology and dedication to research have significantly impacted the development of substrate processing techniques.

Collaborations

Yonekawa's journey in invention has led him to work alongside esteemed colleagues, including Shuhei Takahashi and Kouzou Tachibana. Together, they have collaborated on various projects, sharing insights and innovative ideas that enhance their collective contributions to substrate technology and beyond.

Conclusion

Hiroki Yonekawa's inventive spirit and dedication to innovation underscore his role as a significant contributor to the semiconductor industry. With his patent focused on improving substrate processing methods, he continues to influence advancements in this vital technology sector, showcasing the impact that individual inventors can have on the broader technological landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…