Tokyo, Japan

Hiroki Tokunaga


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Kita, JP (1990)
  • Tokyo, JP (1989 - 2005)

Company Filing History:


Years Active: 1989-2005

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7 patents (USPTO):Explore Patents

Title: **Innovator Hiroki Tokunaga: Pioneering Semiconductor Production Technologies**

Introduction

Hiroki Tokunaga, based in Tokyo, Japan, is an esteemed inventor recognized for his significant contributions to the field of semiconductor production. With a portfolio of seven patents, he has dedicated his career to advancing technologies that enhance the efficiency and reliability of CVD (Chemical Vapor Deposition) systems used in semiconductor manufacturing.

Latest Patents

Tokunaga's latest patents include innovative methods for purging CVD apparatus and techniques for determining maintenance schedules of semiconductor production equipment. His patents focus on enhancing the purging process after maintenance, utilizing a mixed gas of high thermal conductivity and inert gas to optimize the startup of CVD apparatus while reducing the purging time. Additionally, his work on maintenance judgements involves measuring moisture concentration in reaction chambers during corrosive gas treatment, which aids in establishing appropriate maintenance intervals for production apparatus. These inventions not only streamline operations but also contribute to the overall reliability of semiconductor fabrication.

Career Highlights

Throughout his career, Tokunaga has worked with reputable organizations such as Hodogaya Chemical Co., Ltd. and Mochida Pharmaceutical Co., Ltd. His technical expertise and innovative spirit have made a significant impact in the semiconductor industry, where his inventions play a crucial role in advancing production technologies.

Collaborations

In his professional journey, Tokunaga has collaborated with distinguished colleagues, including Ei Mochida and Akio Uemura. These associations have facilitated knowledge exchange and fostered a collaborative atmosphere conducive to innovation in semiconductor technologies.

Conclusion

Hiroki Tokunaga's contributions to semiconductor production through his inventive patents highlight his role as a leading innovator in the industry. His continuous pursuit of advancement in CVD apparatus and maintenance methodologies showcases not only his technical proficiency but also his commitment to enhancing the semiconductor manufacturing process. As technology evolves, Tokunaga's work remains at the forefront of innovation, driving progress in the field.

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