Company Filing History:
Years Active: 2025
Title: Hiroki Sukuki: Innovator in Compound Semiconductor Technology
Introduction
Hiroki Sukuki is a prominent inventor based in Nagano, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of compound semiconductor substrates. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this specialized area.
Latest Patents
Hiroki Sukuki holds a patent for a compound semiconductor substrate that includes a nitride semiconductor layer with varying threading dislocation densities. This invention features a silicon substrate, a first aluminum nitride semiconductor layer that is a graded layer with decreasing aluminum concentration as the distance from the silicon substrate increases, and a gallium nitride layer with a lower average aluminum concentration than the first layer. Additionally, a second aluminum nitride semiconductor layer is formed on the gallium nitride layer, which has a higher average aluminum concentration. Notably, the threading dislocation density within the second aluminum nitride semiconductor layer is lower than that in the first layer, enhancing the overall performance of the substrate.
Career Highlights
Hiroki Sukuki is currently employed at Air Water Inc., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the understanding and application of compound semiconductors in various industries.
Collaborations
Throughout his career, Hiroki has collaborated with notable colleagues, including Sumito Ouchi and Mitsuhisa Narukawa. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Hiroki Sukuki's contributions to the field of compound semiconductors exemplify his dedication to innovation and technology. His patent and ongoing work at Air Water Inc. highlight his role as a key player in advancing semiconductor technology.