Toyama, Japan

Hiroki Okamiya

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2018-2021

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2 patents (USPTO):Explore Patents

Title: **Hiroki Okamiya: Innovator in Substrate Processing Technologies**

Introduction

Hiroki Okamiya is a distinguished inventor based in Toyama, Japan, known for his contributions to substrate processing technology. With two patented innovations to his name, Okamiya plays a pivotal role at Kokusai Electric Corporation, where he focuses on enhancing semiconductor manufacturing processes.

Latest Patents

Okamiya's latest patents demonstrate his expertise in developing advanced processing systems. The first patent is for a **substrate processing apparatus and control system**. This invention comprises a controller that processes a substrate by executing a specific recipe to supply a source gas, forming a film on the substrate. Central to this patent is a pressure controller that regulates the opening of a pressure control valve based on data from a pressure sensor, maintaining the process chamber at a predetermined pressure. Additionally, this controller features a memory that accumulates key data and measures the full close time of the valve, ensuring optimal operation during processing.

The second patent focuses on a **substrate processing apparatus, exhaust system, and method of manufacturing semiconductor devices**. This invention aims to enhance the exhaust capability of the apparatus without compromising its operational efficiency. It includes a processing furnace and an exhaust unit, along with an exhaust device that connects via a vibration-absorbing member. The design ensures all components are aligned on the same plane, significantly improving exhaust efficiency.

Career Highlights

Hiroki Okamiya has made significant strides in his career at Kokusai Electric Corporation, contributing critical technology improvements that facilitate semiconductor manufacturing. His patents reflect his dedication to innovation and his understanding of complex engineering principles.

Collaborations

Throughout his career, Okamiya has collaborated with esteemed colleagues such as Toshihiko Yonejima and Masanori Okuno. These partnerships have fostered a collaborative environment that encourages the development of cutting-edge technologies in the semiconductor field.

Conclusion

Innovators like Hiroki Okamiya are vital to the advancement of technology in the semiconductor industry. His patents not only showcase his technical abilities but also his commitment to pushing the boundaries of substrate processing. As the industry evolves, Okamiya's contributions will undoubtedly play a key role in shaping future innovations.

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