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For the Inventor, By the Inventor

Nagahama, Japan

Hirokazu Otoshi

This inventor holds 15 USPTO granted patents, primarily in Microwave Plasma CVD. Top assignee: Canon Kabushiki Kaisha. Active years: 1991-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirokazu Otoshi. Retrieved from https://idiyas.com/inventor/hirokazu-otoshi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15

% Patents Active = 86.7

Average Co-Inventor Count = 4.3

ph-index = 9

Forward Citations = 177(Granted Patents)


Location History:

  • Nagahama, JP (1991 - 1997)
  • Nara, JP (1996 - 2006)

Company Filing History:

goldMedal15 out of 93,258 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1991-2006

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Areas of Expertise:
Microwave Plasma CVD
Film Formation
Plasma Processing
Deposited Film
Chemical Vapor Deposition
Light Receiving Layer
Electrophotographic Method
Multi-Layered Structures
Apparatus Design
Process Optimization
Silicon Technology
Gas Flow Control
15 patents (USPTO):Explore Patents
1. 7001640 - Apparatus and method for forming deposited film (2006-02-21),
2. 6660094 - Apparatus and method for forming deposited film (2003-12-09),
3. 6338872 - Film forming method (2002-01-15),
4. 6273955 - Film forming apparatus (2001-08-14),
5. 6031198 - Plasma processing method and apparatus (2000-02-29),
6. 5637358 - Microwave plasma chemical vapor deposition process using a microwave (1997-06-10),
7. 5597623 - Process for using microwave plasma CVD (1997-01-28),
8. 5514506 - Light receiving member having a multi-layered light receiving layer with (1996-05-07),
9. 5443645 - Microwave plasma CVD apparatus comprising coaxially aligned multiple gas (1995-08-22),
10. 5439715 - Process and apparatus for microwave plasma chemical vapor deposition (1995-08-08),
11. 5360484 - Microwave plasma CVD apparatus provided with a microwave transmissive (1994-11-01),
12. 5358811 - Electrophotographic method using an amorphous silicon light receiving (1994-10-25),
13. 5087542 - Electrophotographic image-forming method wherein an amorphous silicon (1992-02-11),
14. 5030476 - Process and apparatus for the formation of a functional deposited film (1991-07-09),
15. 5016565 - Microwave plasma chemical vapor deposition apparatus for forming (1991-05-21),

Title: The Innovative Journey of Hirokazu Otoshi

Introduction: Hirokazu Otoshi, a visionary inventor hailing from Nagahama, Japan, has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Hirokazu Otoshi's latest patents include cutting-edge advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to pushing the boundaries of innovation.

Career Highlights: With a career spanning over two decades, Hirokazu Otoshi has established himself as a pioneer in the field of technology, holding numerous patents that have revolutionized industries worldwide. His ability to blend creativity with technical expertise has led to the development of products that have changed the way we live and work.

Collaborations: Throughout his career, Hirokazu Otoshi has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His collaborative spirit and passion for innovation have resulted in successful partnerships that have furthered the impact of his work.

Conclusion: Hirokazu Otoshi's relentless pursuit of innovation and his dedication to creating a better future through technology make him a true trailblazer in the world of inventions. His legacy will continue to inspire future generations of inventors to dream big and push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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