Nara, Japan

Hirokazu Ohtoshi


Average Co-Inventor Count = 4.9

ph-index = 10

Forward Citations = 224(Granted Patents)


Location History:

  • Kawasaki, JP (1988)
  • Nagahama, JP (1993 - 1996)
  • Nara, JP (1995 - 2010)

Company Filing History:


Years Active: 1988-2010

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22 patents (USPTO):

Title: Innovations by Hirokazu Ohtoshi: A Glimpse into His Patents and Career

Introduction:

Hirokazu Ohtoshi, hailing from Nara, Japan, has made significant contributions to the field of technology, specifically through his work at Canon Kabushiki Kaisha. With an impressive portfolio of 22 patents, he has been instrumental in advancing methodologies and apparatuses that enhance processing systems in various applications.

Latest Patents:

Among his most recent innovations are two notable patents: the "Leak Judgment Method" and the "Computer-Readable Recording Medium with Recorded Leak-Judgment-Executable Program." The leak judgment method focuses on detecting leaks in deposited-film formation processes, particularly when utilizing spontaneously ignitable gases. This innovation is crucial as it allows for the immediate identification of leaks, preventing potential hazards from air ingress during unexpected incidents, such as a break in evacuation piping. The second patent introduces an advanced substrate-processing method that optimizes the delivery and processing of substrates, ensuring efficient operation while detecting transport abnormalities through a sophisticated mechanism.

Career Highlights:

Throughout his career at Canon Kabushiki Kaisha, Hirokazu Ohtoshi has demonstrated exceptional ingenuity and expertise. His notable patents reflect a deep understanding of substrate processing and safety measures in film formation processes. Ohtoshi's technical contributions have been vital in enhancing the reliability and safety of equipment used in high-precision industries.

Collaborations:

In his pursuit of innovation, Hirokazu Ohtoshi has collaborated with esteemed colleagues, including Masahiro Kanai and Ryuji Okamura. These partnerships have enabled a productive exchange of ideas, fostering an environment ripe for technological advancements and patent development.

Conclusion:

Hirokazu Ohtoshi's extensive work and dedication to innovation have made a remarkable impact on the technology sector. His patents showcase his commitment to improving safety and efficiency in substrate processing, positioning him as a notable inventor in his field. As he continues to work at Canon Kabushiki Kaisha, his future endeavors promise to further elevate the standards of technological innovation.

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