Company Filing History:
Years Active: 2002-2006
Title: Hiroharu Hashiguchi: Innovator in Substrate Processing Technologies
Introduction
Hiroharu Hashiguchi is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing, particularly in methods that enhance the efficiency and uniformity of chemical reactions in lithography processes. With a total of 2 patents to his name, Hashiguchi's work is recognized for its innovative approach to substrate treatment.
Latest Patents
Hashiguchi's latest patents include a substrate processing method and apparatus, as well as a substrate carrying method. These inventions focus on the processing of substrates that have undergone pre-treatment. The method involves carrying the substrate to a heat treatment unit for heating before supplying a treatment solution. This process is designed to ensure that the period after pretreatment is fixed, which is crucial for achieving uniform chemical reactions in coating films during exposure processing.
Career Highlights
Hiroharu Hashiguchi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative substrate processing techniques, contributing to advancements in the field.
Collaborations
Hashiguchi collaborates with Kouji Okamura, a fellow innovator in the industry. Their partnership has fostered the development of new technologies and methods that enhance substrate processing efficiency.
Conclusion
Hiroharu Hashiguchi's contributions to substrate processing technology reflect his commitment to innovation and excellence. His patents are a testament to his expertise and the impact of his work in the semiconductor industry.