Hirofumi Sakata

Title: Hirofumi Sakata: Innovator in Semiconductor Technology

Introduction

Hirofumi Sakata is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Sakata has focused on enhancing the efficiency and durability of semiconductor devices.

Latest Patents

Sakata's latest patents include a mask for transferring a pattern for use in a semiconductor device. This invention aims to improve durability while allowing for the formation of very fine circuit patterns using a light-shielding film. The mask consists of a silicon monocrystalline film, an aluminum monocrystalline film, and an aluminum oxide film, all formed on a mask substrate to achieve specific pattern features. The silicon and aluminum monocrystalline films serve as the light-shielding film, while the aluminum oxide film acts as an anti-reflection and protection film.

Career Highlights

Throughout his career, Hirofumi Sakata has worked with prominent companies in the semiconductor industry. He has been associated with Mitsubishi Electric Corporation and Ryoden Semiconductor System Engineering Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Sakata has collaborated with various professionals in his field, including his coworker Tadashi Nishioka. These collaborations have likely played a role in the development of his innovative patents and advancements in semiconductor technology.

Conclusion

Hirofumi Sakata is a distinguished inventor whose work in semiconductor technology has led to significant advancements. His innovative patents reflect his commitment to improving the efficiency and durability of semiconductor devices. His contributions continue to influence the industry and inspire future innovations.