Miyagi, Japan

Hirofumi Ohta

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirofumi Ohta. Retrieved from https://idiyas.com/inventor/hirofumi-ohta-0dv7266q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

**Title: Hirofumi Ohta - Innovator in Plasma Processing Technology**

Introduction

Hirofumi Ohta is a talented inventor based in Miyagi, Japan, known for his contributions to the field of plasma processing technology. With a keen understanding of advanced materials and processes, Ohta has made significant strides in innovation, ultimately leading to the development of a notable patent that enhances plasma processing equipment.

Latest Patents

Ohta holds a patent for a plasma processing apparatus. This innovative device features a conductive mounting table with a distinct design, including a mounting portion for substrate placement and a stepped portion positioned lower than the mounting area. Additionally, the apparatus incorporates a conductive member that extends outward from the stepped portion, ensuring efficient processing capabilities. The first insulating member is strategically placed on or above the upper surface of the conductive member, optimizing the apparatus's performance for various applications in the semiconductor industry.

Career Highlights

Ohta is currently affiliated with Tokyo Electron Limited, a leading company in the semiconductor equipment sector. His work at Tokyo Electron has allowed him to engage in cutting-edge research and development, further advancing the field of plasma processing and related technologies.

Collaborations

Throughout his career, Hirofumi Ohta has collaborated with esteemed colleagues, including Hidetoshi Hanaoka and Ayuta Suzuki. These partnerships have fostered a creative environment, leading to groundbreaking innovations and improvements in plasma processing equipment.

Conclusion

Hirofumi Ohta's contributions to the field of plasma processing technology underscore his role as an important inventor in the industry. His patented plasma processing apparatus exemplifies his commitment to innovation, paving the way for enhanced manufacturing processes within the semiconductor sector. As technology continues to evolve, Ohta's work will remain pivotal to advancements in this critical area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…