Osaka, Japan

Hirofumi Inari

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 4.1

ph-index = 1


Location History:

  • Osaka, JP (2014 - 2017)
  • Settsu, JP (2021)

Company Filing History:


Years Active: 2014-2021

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5 patents (USPTO):Explore Patents

Title: Hirofumi Inari: Innovator in Photosensitive Compositions

Introduction

Hirofumi Inari is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of photosensitive compositions, holding a total of 5 patents. His work focuses on developing innovative materials that enhance the performance and reliability of electronic devices.

Latest Patents

Inari's latest patents include a photosensitive composition that contains a polysiloxane compound, a photoacid generator, a coloring agent, and a solvent. This composition is designed to form colored patterns, with a specific weight percentage of the coloring agent being 5% or more. Additionally, the polysiloxane compound features a cyclic polysiloxane structure and a cationically polymerizable functional group. Another notable patent is for a positive photosensitive composition that exhibits excellent patterning properties and electrical insulation reliability when cured as thin films. This composition includes various compounds that decompose in the presence of acid to generate acidic or hydroxyl groups, along with a hydrosilylation catalyst and a photoacid generator.

Career Highlights

Hirofumi Inari is currently employed at Kaneka Corporation, where he continues to innovate in the field of materials science. His work has been instrumental in advancing the technology behind photosensitive compositions, which are crucial for various applications in electronics and manufacturing.

Collaborations

Inari collaborates with talented coworkers, including Aki Kitajima and Masahito Ide. Their combined expertise contributes to the development of cutting-edge technologies and enhances the research capabilities at Kaneka Corporation.

Conclusion

Hirofumi Inari's contributions to the field of photosensitive compositions demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials science and a drive to improve electronic device performance.

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