Kaneka Corporation

Hirofumi Inari

Takao Manabe

Masahito Ide

Aki Kitajima

Kimihide Nishimura

Komei Tahara

Katsuyuki Tanaka

Susumu Amano

Yoshikatsu Ichiryu

A photosensitive composition contains a polysiloxane compound, a photoacid generator, a coloring agent and a solvent. A content of the coloring agent with respect to a total solid content of the composition is 5% by weight or more. The polysiloxane compound contains a cyclic polysiloxane structure and a cationically polymerizable functional group. The polysiloxane compound may further have an alkali-soluble functional group. A content of the polysiloxane compound with respect to the total solid content of the composition is preferably 20-80% by weight. The photosensitive composition is used, for example, in formation of a colored pattern.

Photosensitive composition, colored pattern and method for producing same

The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.

Positive photosensitive composition, thin film transistor, and compound

The present invention provides a (meth)acrylic resin composition comprising a carboxylic acid group produced by heating a (meth)acrylic-based resin (C), wherein the (meth)acrylic-based resin (C) is obtained by polymerizing a monomer mixture (A) containing 80 to 99 wt % of a linear alkyl (meth)acrylate and 1 to 20 wt % of tertiary-butyl (meth)acrylate, in the presence of an acrylic acid ester-based crosslinked elastic particle (B) that is obtained by mixing and polymerizing 0.5 to 5 parts by weight of a polyfunctional monomer having at least two non-conjugated double bonds per molecule, with respect to 100 parts by weight of a monomer mixture containing 50 to 100 wt % of an alkyl acrylate monomer and 0 to 50 wt % of an alkyl methacrylate monomer. This composition can be used to produce a film having excellent chemical resistance (in particular, sun-screening agent resistance).

(Meth)acrylic resin composition, imidized (meth)acrylic resin composition, and film obtained by molding them

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Osaka, Japan

Hirofumi Inari