The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2014

Filed:

Nov. 09, 2007
Applicants:

Hirofumi Inari, Osaka, JP;

Katsuyuki Tanaka, Osaka, JP;

Kimihide Nishimura, Hyogo, JP;

Inventors:

Hirofumi Inari, Osaka, JP;

Katsuyuki Tanaka, Osaka, JP;

Kimihide Nishimura, Hyogo, JP;

Assignee:

Kaneka Corporation, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 33/06 (2006.01); C08F 8/32 (2006.01); C08F 220/00 (2006.01); C08F 265/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a (meth)acrylic resin composition comprising a carboxylic acid group produced by heating a (meth)acrylic-based resin (C), wherein the (meth)acrylic-based resin (C) is obtained by polymerizing a monomer mixture (A) containing 80 to 99 wt % of a linear alkyl (meth)acrylate and 1 to 20 wt % of tertiary-butyl (meth)acrylate, in the presence of an acrylic acid ester-based crosslinked elastic particle (B) that is obtained by mixing and polymerizing 0.5 to 5 parts by weight of a polyfunctional monomer having at least two non-conjugated double bonds per molecule, with respect to 100 parts by weight of a monomer mixture containing 50 to 100 wt % of an alkyl acrylate monomer and 0 to 50 wt % of an alkyl methacrylate monomer. This composition can be used to produce a film having excellent chemical resistance (in particular, sun-screening agent resistance).


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