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Title: Hirobumi Matsumoto: Innovator in Plasma Processing Technology
Introduction
Hirobumi Matsumoto, an esteemed inventor located in Kanagawa, Japan, has made significant contributions to the field of plasma processing technology. With a focus on innovative apparatus designs, Matsumoto holds one notable patent that showcases his ingenuity and expertise within this specialized field.
Latest Patents
Matsumoto's patent features a unique plasma processing apparatus that utilizes an intricately designed antenna. This apparatus includes a plasma chamber equipped with both a gas inlet and a gas outlet, which provides a dynamic environment for semiconductor processing. By integrating a first high-frequency energy source, this device accelerates energy directed at a holder supporting a semiconductor specimen. The patent specifically details how gas can be introduced through the inlet, allowing it to be accelerated by an electric field toward the specimen. Furthermore, a second high-frequency energy source powers an antenna structure designed to excite gas within the chamber, thereby converting it into high-density plasma. This innovative apparatus utilizes antenna elements that extend radially outward, providing a phase difference of 180 degrees between adjacent elements, optimizing the process of plasma generation.
Career Highlights
Hirobumi Matsumoto's career includes impactful roles at notable companies such as NEC Corporation and Nihon Koshuha Co., Ltd. His experience in these organizations has undoubtedly contributed to his development as an inventor, equipping him with the skills and knowledge required to innovate effectively within the industry.
Collaborations
Throughout his career, Matsumoto has collaborated with distinguished professionals, including Seiji Samukawa and Kibatsu Shinohara. These partnerships have fostered a rich exchange of ideas and expertise, further enhancing the innovations that emerge from his work in plasma processing technology.
Conclusion
Hirobumi Matsumoto stands out as an influential figure in the realm of plasma processing innovations. His groundbreaking patent represents a significant advancement in semiconductor technology, highlighting his commitment to enhancing efficiency and effectiveness in the field. With his extensive career and collaborative spirit, Matsumoto continues to inspire future advancements and innovations within the industry.