Tsuchiura, Japan

Hiroaki Kimura

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Seimitsu Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroaki Kimura. Retrieved from https://idiyas.com/inventor/hiroaki-kimura-iwmp3eo8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hiroaki Kimura: Innovator in Inner Surface Shape Measurement Technology

Introduction

Hiroaki Kimura is a notable inventor based in Tsuchiura, Japan. He has made significant contributions to the field of measurement technology, particularly with his innovative devices designed for precise measurements of inner surface shapes.

Latest Patents

Hiroaki Kimura holds a patent for an "Inner surface shape measurement device, and alignment method for inner surface shape measurement device." This invention utilizes a camera to observe the positions of a small hole in a workpiece, which is fixed to a linear-and-tilting-motion stage and rotates with a rotating body. The device calculates the position and tilt of the small hole based on the coordinates of the observed positions, providing valuable small hole information that includes both position and tilt.

Career Highlights

Hiroaki Kimura is associated with Tokyo Seimitsu Co., Ltd., where he has been instrumental in developing advanced measurement technologies. His work has been recognized for its precision and effectiveness in various industrial applications.

Collaborations

Hiroaki has collaborated with notable colleagues, including Hideki Morii and Katsufumi Moriyama, contributing to the advancement of measurement technologies through teamwork and shared expertise.

Conclusion

Hiroaki Kimura's innovative work in inner surface shape measurement technology exemplifies the importance of precision in engineering. His contributions continue to influence the field and enhance measurement accuracy in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…