Tilburg, Netherlands

Hindrik Willem De Vries

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 1.9

ph-index = 1

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 2001-2014

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3 patents (USPTO):Explore Patents

Title: Hindrik Willem De Vries: Innovator in Plasma Surface Treatment

Introduction

Hindrik Willem De Vries is a notable inventor based in Tilburg, Netherlands. He has made significant contributions to the field of plasma surface treatment, holding a total of three patents. His work focuses on innovative methods and apparatuses that enhance the treatment of substrates using atmospheric pressure plasma.

Latest Patents

One of his latest patents is titled "Method and apparatus for plasma surface treatment of a moving substrate." This invention involves a method and apparatus for treating a substrate surface using atmospheric pressure plasma. The system includes a treatment space between two electrodes, where a substrate and a mask web are moved synchronously through the treatment area. A plasma generating power is applied to the electrodes to treat the exposed surface areas of the substrate.

Another significant patent is "Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions." This apparatus comprises at least two oppositely spaced electrodes and means for supplying a gas or gas mixture in the discharge space. It also includes an AC power supply for energizing the electrodes and electric stabilization means to manage current variations in the plasma.

Career Highlights

Hindrik has worked with prominent companies such as Fuji Photo Film B.V. and Fujifilm Manufacturing Europe B.V. His experience in these organizations has contributed to his expertise in plasma technology and surface treatment processes.

Collaborations

Throughout his career, Hindrik has collaborated with notable professionals, including Eugen Aldea and Fuyuhiko Mori. These collaborations have likely enriched his work and led to advancements in his field.

Conclusion

Hindrik Willem De Vries is a distinguished inventor whose work in plasma surface treatment has led to innovative patents that enhance substrate processing. His contributions to the industry reflect his commitment to advancing technology in this specialized area.

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